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Roughness models for particle adhesion

By Stephen Beaudoin1, Ravi Jaiswal1, Caitlin Kilroy1

1. Purdue University

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The effects of different surface roughness models on a previously developed van der Waals adhesion model were examined. The van der Waals adhesion model represented surface roughness with a distribution of hemispherical asperities. It was found that the constraints used to define the asperity distribution on the surface, which were determined from AFM scans, varied with scan size and thus were not constant for all surfaces examined. The greatest variation in these parameters occurred with materials that had large asperities or with materials where a large fraction of the surface was covered by asperities. These rough surfaces were modeled with fractals and also with a fast Fourier transform algorithm. When the model surfaces generated using the Fourier transforms are used in the adhesion model, the model accurately predicts the experimentally observed adhesion forces measured with the AFM.


Steve Beaudoin, Sean Eichenlaub and Anne Gelb. School of Chemical Engineering, Purdue University.

Cite this work

Researchers should cite this work as follows:

  • Journal of Colloid and Interface Science 280 (2004) 289–298
  • Stephen Beaudoin; Ravi Jaiswal; Caitlin Kilroy (2007), "Roughness models for particle adhesion,"

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