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  1. Knowledge-based systems
  2. Discrete element model (DEM)
  3. QbD presentation
  4. Particle adhesion
  5. Van der waals force
  6. Process modeling
  7. Hamaker constants
  8. Particle-based computations
  9. Roller compaction
  10. Johanson's model
  11. Dry granulation
  12. Statistical model building
  13. Molecular modeling
  14. Excipients
  15. Visualization
  16. Database
  17. Active pharmaceutical ingredient (API)

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Particle and Thin Film Adhesion

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In This Series

  1. Discussion on Hamaker Constant

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    09 May 2008 | Publications | Contributor(s): Stephen Beaudoin, Ravi Jaiswal, Caitlin Kilroy

    The Hamaker constant is a force constant used for describing the van der Waals (vdW) force. The magnitude of the Hamaker constant reflects the strength of the vdW force between two particles, or between a particle and a substrate. It depends on the material properties of both the interacting bodies …

  2. Basic Forces in Particle Adhesion

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    28 Jan 2008 | Online Presentations | Contributor(s): Stephen Beaudoin

    Particle adhesion to surfaces is important in a wide range of industrial applications. This brief presentation is designed to provide an introduction to the forces that influence particle adhesion in air or liquid environments. It is not designed to provide information at great depth or …

  3. Particle Adhesion

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    25 Jan 2008 | Tools | Contributor(s): Stephen Beaudoin, Ravi Jaiswal, Caitlin Kilroy, Dave Balachandran

    Particle Adhesion

  4. Roughness models for particle adhesion

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    20 Dec 2007 | Publications | Contributor(s): Stephen Beaudoin, Ravi Jaiswal, Caitlin Kilroy

    The effects of different surface roughness models on a previously developed van der Waals adhesion model were examined. The van der Waals adhesion model represented surface roughness with a distribution of asperities. It was found that the constraints used to define the asperity distribution on …

  5. Simulation of the Adhesion of Particles to Surfaces

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    20 Dec 2007 | Publications | Contributor(s): Stephen Beaudoin, Ravi Jaiswal, Caitlin Kilroy

    The removal of micrometer and submicrometer particles from dielectric and metal films represents a challenge in postchemical mechanical polishing cleaning. Proper modeling of the adhesive force between contaminant particles and these films is needed to develop optimal solutions to postchemical …

  6. Hamaker Constants in Integrated Circuit Metallization

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    20 Dec 2007 | Publications | Contributor(s): Stephen Beaudoin, Ravi Jaiswal, Caitlin Kilroy

    A new method for determining Hamaker constants was examined for materials of interest in integrated circuit manufacture. An ultra-high vacuum atomic force microscope and an atomic force microscope operated in a nitrogen environment were used to measure the interaction forces between metals, …

  7. A Theoretical and Experimental Study of Surface Forces in Adhesion of Particles to Thin Films

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    20 Dec 2007 | Publications | Contributor(s): Stephen Beaudoin, Ravi Jaiswal, Caitlin Kilroy

    The interactions between micron- and nano-particles and rough surfaces are of great importance and have numerous applications in surface science and biotechnology. It is essential to have estimates of surface/intermolecular forces between interacting bodies to describe and to manipulate the nature …

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