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Collaboration for pharmaceutical engineering and science
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Particle and Thin Film Adhesion
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20 Dec 2007 | Series | Contributor(s): Stephen Beaudoin, Ravi Jaiswal, Caitlin Kilroy
The adhesion of micron and sub-micron scale particles to surfaces is of tremendous interest in a wide range of industrial and civilian applications. We measure directly the adhesion of particles to surfaces using atomic force microscopy and develop experimentally-validated, science-based models for …
Discussion on Hamaker Constant
09 May 2008 | Publications | Contributor(s): Stephen Beaudoin, Ravi Jaiswal, Caitlin Kilroy
The Hamaker constant is a force constant used for describing the van der Waals (vdW) force. The magnitude of the Hamaker constant reflects the strength of the vdW force between two particles, or between a particle and a substrate. It depends on the material properties of both the interacting bodies …
Hamaker Constants in Integrated Circuit Metallization
20 Dec 2007 | Publications | Contributor(s): Stephen Beaudoin, Ravi Jaiswal, Caitlin Kilroy
A new method for determining Hamaker constants was examined
for materials of interest in integrated circuit manufacture. An
ultra-high vacuum atomic force microscope and an atomic force microscope
operated in a nitrogen environment were used to measure
the interaction forces between metals, …
Simulation of the Adhesion of Particles to Surfaces
The removal of micrometer and submicrometer particles from
dielectric and metal films represents a challenge in postchemical
mechanical polishing cleaning. Proper modeling of the adhesive
force between contaminant particles and these films is needed to
develop optimal solutions to postchemical …
Roughness models for particle adhesion
The effects of different surface roughness models on a previously developed van der Waals adhesion model were examined. The van der Waals adhesion model represented surface roughness with a distribution of asperities. It was found that the constraints used to
define the asperity distribution on …
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