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1. Particle and Thin Film Adhesion

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   20 Dec 2007 | Series | Contributor(s): Stephen Beaudoin, Ravi Jaiswal, Caitlin Kilroy

   The adhesion of micron and sub-micron scale particles to surfaces is of tremendous interest in a wide range of industrial and civilian applications. We measure directly the adhesion of particles to surfaces using atomic force microscopy and develop experimentally-validated, science-based models for …

2. Discussion on Hamaker Constant

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   09 May 2008 | Publications | Contributor(s): Stephen Beaudoin, Ravi Jaiswal, Caitlin Kilroy

   The Hamaker constant is a force constant used for describing the van der Waals (vdW) force. The magnitude of the Hamaker constant reflects the strength of the vdW force between two particles, or between a particle and a substrate. It depends on the material properties of both the interacting bodies …

3. Simulation of the Adhesion of Particles to Surfaces

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   20 Dec 2007 | Publications | Contributor(s): Stephen Beaudoin, Ravi Jaiswal, Caitlin Kilroy

   The removal of micrometer and submicrometer particles from dielectric and metal films represents a challenge in postchemical mechanical polishing cleaning. Proper modeling of the adhesive force between contaminant particles and these films is needed to develop optimal solutions to postchemical …

4. Hamaker Constants in Integrated Circuit Metallization

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   20 Dec 2007 | Publications | Contributor(s): Stephen Beaudoin, Ravi Jaiswal, Caitlin Kilroy

   A new method for determining Hamaker constants was examined for materials of interest in integrated circuit manufacture. An ultra-high vacuum atomic force microscope and an atomic force microscope operated in a nitrogen environment were used to measure the interaction forces between metals, …

5. Roughness models for particle adhesion

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   20 Dec 2007 | Publications | Contributor(s): Stephen Beaudoin, Ravi Jaiswal, Caitlin Kilroy

   The effects of different surface roughness models on a previously developed van der Waals adhesion model were examined. The van der Waals adhesion model represented surface roughness with a distribution of asperities. It was found that the constraints used to define the asperity distribution on …

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